Paper
20 February 1998 Nondestructive measurement of layer thickness in double heterostructures by x-ray double crystal diffraction
Yi Qu, Xueqian Li, Xiaowei Song, Xingde Zhang, Li-Ding Wang, Xiping Qie
Author Affiliations +
Proceedings Volume 3175, Third International Conference on Thin Film Physics and Applications; (1998) https://doi.org/10.1117/12.300707
Event: Third International Conference on Thin Film Physics and Applications, 1997, Shanghai, China
Abstract
In this paper we introduce a method of measuring thin layer thickness using a sandwich structure of the In0.43Ga0.57As0.15P0.85/In0.13Ga0.87As0.75P0.25/In0.43Ga0.57As0.15P0.85 DH with the interference fringes in rocking curve by x-ray double-crystal diffraction.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yi Qu, Xueqian Li, Xiaowei Song, Xingde Zhang, Li-Ding Wang, and Xiping Qie "Nondestructive measurement of layer thickness in double heterostructures by x-ray double crystal diffraction", Proc. SPIE 3175, Third International Conference on Thin Film Physics and Applications, (20 February 1998); https://doi.org/10.1117/12.300707
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KEYWORDS
Diffraction

X-ray diffraction

X-rays

Crystals

Gallium

Heterojunctions

Nondestructive evaluation

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