Reticle defects on optical proximity correction features

Larry S. Zurbrick

doi:10.1117/12.328858

1 September 1998 Reticle defects on optical proximity correction features

Larry S. Zurbrick

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328858
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

A test mask has been developed and used to characterize automatic defect inspection systems. Characterization was performed on three generations of inspections algorithm and revealed an increase in the detection rate of defects on serifs and jogs with each succeeding algorithm and equipment generation.

Citation Download Citation

Larry S. Zurbrick "Reticle defects on optical proximity correction features", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328858

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