New holographic recording materials based on dual-cure photopolymer systems

Daniel-Joseph Lougnot; Colette Turck; C. Leroy-Garel

doi:10.1117/12.323491

25 September 1998 New holographic recording materials based on dual-cure photopolymer systems

Daniel-Joseph Lougnot, Colette Turck, C. Leroy-Garel

Proceedings Volume 3417, Photopolymer Device Physics, Chemistry, and Applications IV; (1998) https://doi.org/10.1117/12.323491
Event: Lasers and Materials in Industry and Opto-Contact Workshop, 1998, Quebec, Canada

Abstract

The limitation of the holographic sensitivity of photopolymer materials mostly result from an imbalance between photocrosslinking copolymerization and mass transfer processes. The development of new blends containing acrylate and vinyl ether monomers which undergo hybrid-cure polymerization, makes it possible to evade some of the typical shortcomings of multiacrylate formulations resulting thereof. Self-processing materials exhibiting an holographic sensitivity of up to 200 cm²/J and an energetic sensitivity below 20 mJ/cm² are reported. The improvement of the reciprocity between exposure and holographic intensity opens up attractive prospects for applications requiring holographic exposure shorter than 0.5 second.

Citation Download Citation

Daniel-Joseph Lougnot, Colette Turck, and C. Leroy-Garel "New holographic recording materials based on dual-cure photopolymer systems", Proc. SPIE 3417, Photopolymer Device Physics, Chemistry, and Applications IV, (25 September 1998); https://doi.org/10.1117/12.323491

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