Paper
15 October 1982 Overlay Characterization Of Projection Aligners Using Electrical Probe Techniques
C. P. Ausschnitt, T. A. Brunner, S. C. Yang
Author Affiliations +
Proceedings Volume 0342, Integrated Circuit Metrology I; (1982) https://doi.org/10.1117/12.933681
Event: 1982 Technical Symposium East, 1982, Arlington, United States
Abstract
We describe an approach to overlay measurement based upon well-known electrical probe techniques. The advantages realized by our approach are process simplicity, measurement precision of ±0.01μm, independence from imagery and process variations, site-by-site accuracy verification, and the capability of performing many successive overlay evaluations on a single reference wafer. We present the results of overlay performance evaluations of state-of-the-art 1:1 projection printers, including alignment and distortion components and the variable magnification capability.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. P. Ausschnitt, T. A. Brunner, and S. C. Yang "Overlay Characterization Of Projection Aligners Using Electrical Probe Techniques", Proc. SPIE 0342, Integrated Circuit Metrology I, (15 October 1982); https://doi.org/10.1117/12.933681
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Semiconducting wafers

Overlay metrology

Optical alignment

Distortion

Photomasks

Integrated circuits

Metrology

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