Semiconductor process tool effluent characterization using extractive FTIR with fast data acquisition

Curtis T. Laush

doi:10.1117/12.339056

10 February 1999 Semiconductor process tool effluent characterization using extractive FTIR with fast data acquisition

Curtis T. Laush

Proceedings Volume 3534, Environmental Monitoring and Remediation Technologies; (1999) https://doi.org/10.1117/12.339056
Event: Photonics East (ISAM, VVDC, IEMB), 1998, Boston, MA, United States

Abstract

A system has been developed using extractive FTIR techniques to characterize the gaseous emissions from semiconductor wafer process tools. The system provides real-time data collection, processing and display for multiple compounds simultaneously. Tool effluent emission profiles that track concentrations are produced with time resolutions on the order of seconds. Along with a description of the hardware, sampling and analysis methods, the results of some field testing and system validations are also presented.

Citation Download Citation

Curtis T. Laush "Semiconductor process tool effluent characterization using extractive FTIR with fast data acquisition", Proc. SPIE 3534, Environmental Monitoring and Remediation Technologies, (10 February 1999); https://doi.org/10.1117/12.339056

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available