Manufacturing technology by synchrotron radiation in NSRL

Xinyi Zhang; Dapeng Chen; Yiguan Hu; Yangchao Tian; Shaojun Fu; Ya Kan; Andong Xia; Yilin Hong; Xiaoming Tao; Gang Liu

doi:10.1117/12.317908

15 August 1998 Manufacturing technology by synchrotron radiation in NSRL

Xinyi Zhang, Dapeng Chen, Yiguan Hu, Yangchao Tian, Shaojun Fu, Ya Kan, Andong Xia, Yilin Hong, Xiaoming Tao, Gang Liu

Proceedings Volume 3550, Laser Processing of Materials and Industrial Applications II; (1998) https://doi.org/10.1117/12.317908
Event: Photonics China '98, 1998, Beijing, China

Abstract

In this paper a brief description is given to introduce the activities of the manufacturing technology using the synchrotron radiation light source in the National Synchrotron Radiation Laboratory (NSRL). The light source in NSRL is a dedicated synchrotron radiation facility in China. Five beamlines and corresponding experimental stations, including soft x-ray lithography, have been constructed. The main experimental results obtained from the soft x-ray lithography station are reported. We have fabricated some devices using the synchrotron radiation lithography, for example, the high electron mobility transistor, high T_c superconductor infrared detector-array, diffraction grating, and micro condenser zone plate. A simple method for the achievement of synchrotron radiation x-ray lithography mask will also be presented. The LIGA (German abbreviation for: Lithograpie, Galvanoforming, and Abforming) technique has been developed in NSRL. It is the most promising technique for the fabrication of three-dimensional microstructures. We are successful in making several microdevices by deep x-ray lithography and microelectroforming, such as microgearwheel, micro acceleration sensor.

Citation Download Citation

Xinyi Zhang, Dapeng Chen, Yiguan Hu, Yangchao Tian, Shaojun Fu, Ya Kan, Andong Xia, Yilin Hong, Xiaoming Tao, and Gang Liu "Manufacturing technology by synchrotron radiation in NSRL", Proc. SPIE 3550, Laser Processing of Materials and Industrial Applications II, (15 August 1998); https://doi.org/10.1117/12.317908

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KEYWORDS

Synchrotron radiation

Photomasks

Lithography

X-ray lithography

Gold

Sensors

Fabrication

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