Effect of cresol monomers in three-component novolak resin on photolithographic performance

Woo-Kyu Kim; M. Dalil Rahman; Stanley A. Ficner; Dinesh N. Khanna

doi:10.1117/12.350171

11 June 1999 Effect of cresol monomers in three-component novolak resin on photolithographic performance

Woo-Kyu Kim, M. Dalil Rahman, Stanley A. Ficner, Dinesh N. Khanna

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350171
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

In our previous publication we reported an improved process for isolation of novolak resins form phenol-formaldehyde condensation mixtures. The process results in resins having low polydispersity and slow photospeed. Novolak resins were prepared by the same process, employing different ratios of the cresol components. This paper will discuss an experimental design analyzing relationship between cresol component ratios and properties of the resins. The characteristics of the resins and their effect on the lithographic performances as an i-line photoresist composition will also be discussed.

Citation Download Citation

Woo-Kyu Kim, M. Dalil Rahman, Stanley A. Ficner, and Dinesh N. Khanna "Effect of cresol monomers in three-component novolak resin on photolithographic performance", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350171

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