Assessment of synchronous filtering as an alternative to phase-shifting masks at k1=0.4

Andrew R. Neureuther; Meng Li

doi:10.1117/12.354353

26 July 1999 Assessment of synchronous filtering as an alternative to phase-shifting masks at k₁=0.4

Andrew R. Neureuther, Meng Li

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354353
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

This paper examines the extent to which off-axis illumination and pupil filtering can be combined as an interactive system to compensate the fundamental problem of the low diffraction efficiency of binary masks to improve working lithographic resolution. A sequential partial exposure and synchronous filtering technique is utilized which is a form of synthetic-aperture lithography (SAL) described by T. Sanstrom. An optimum off-axis illumination and filter transmission of 0.5 for an 0.35 (lambda) /NA equal line and space grating is shown to produce a lithographically useful contrast of 70 percent in best focus that only deteriorates to 63 percent at a full Rayleigh unit defocus. The feature type and size dependencies of this method are explored. Most improvement was observed for small dark feature in large bright fields which are suitable for printing small islands or logic gates in negative resists.

Citation Download Citation

Andrew R. Neureuther and Meng Li "Assessment of synchronous filtering as an alternative to phase-shifting masks at k₁=0.4", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354353

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