Laser technologies in diffractive optics

Voldemar Petrovich Koronkevich; Victor Pavlovich Korolkov; Alexander G. Poleshchuk

doi:10.1117/12.340090

28 January 1999 Laser technologies in diffractive optics

Voldemar Petrovich Koronkevich, Victor Pavlovich Korolkov, Alexander G. Poleshchuk

Author Affiliations +

Proceedings Volume 3733, ICONO '98: Nonlinear Optical Phenomena and Coherent Optics in Information Technologies; (1999) https://doi.org/10.1117/12.340090
Event: ICONO '98: Laser Spectroscopy and Optical Diagnostics: Novel Trends and Applications in Laser Chemistry, Biophysics, and Biomedicine, 1998, Moscow, Russian Federation

Abstract

Computer-generated holograms are limited by conventional lithographic fabrication capabilities, which rely on accurate deposition, exposure, and developing of photosensitive chemicals. We present alternate fabrication technologies, which use a focused laser beam to write submicron patterns by inducing changes in a metal or silicon film and LDW glass. Circular laser writing systems built at IA&E are described. This paper has reviewed some techniques and equipment for the fabrication of binary, multilevel and continuous-relief DOEs developed at IA&E.

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Voldemar Petrovich Koronkevich, Victor Pavlovich Korolkov, and Alexander G. Poleshchuk "Laser technologies in diffractive optics", Proc. SPIE 3733, ICONO '98: Nonlinear Optical Phenomena and Coherent Optics in Information Technologies, (28 January 1999); https://doi.org/10.1117/12.340090

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