Development of soft x-ray multilayer mirrors for a wavelength of 3 nm

Kiwamu Sakano; Masaki Yamamoto

doi:10.1117/12.371122

23 November 1999 Development of soft x-ray multilayer mirrors for a wavelength of 3 nm

Kiwamu Sakano, Masaki Yamamoto

Proceedings Volume 3767, EUV, X-Ray, and Neutron Optics and Sources; (1999) https://doi.org/10.1117/12.371122
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

Fabrication process of soft X-ray multilayer mirrors composed of Sc/Cr having shown high reflectances above 10% including the highest 14.8% for a wavelength of 3 nm is described. The multilayers were prepared by ion beam sputtering of an electron cyclotron resonance type enabling sputter deposition at the highest vacuum of 0.03m Torr. The multilayers were prepared at a stable deposition rate within 4 hours to suppress period instability and also at various substrate temperatures to find the best condition to suppress the interface roughness.

Citation Download Citation

Kiwamu Sakano and Masaki Yamamoto "Development of soft x-ray multilayer mirrors for a wavelength of 3 nm", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); https://doi.org/10.1117/12.371122

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