Optimum conditions for thermal fixing of volume holograms in Fe:LiNbO3

Shiuan-Huei Lin; Chao Ray Hsieh; Tai Chiung Hsieh; Ken Yuh Hsu; Arthur E. T. Chiou

doi:10.1117/12.363921

20 September 1999 Optimum conditions for thermal fixing of volume holograms in Fe:LiNbO3

Shiuan-Huei Lin, Chao Ray Hsieh, Tai Chiung Hsieh, Ken Yuh Hsu, Arthur E. T. Chiou

Proceedings Volume 3801, Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V; (1999) https://doi.org/10.1117/12.363921
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

The kinetics of the recording, compensating, and developing processes in two typical thermal fixing procedures (L-H-L and H-L procedures) are analyzed. The optimum condition (in terms of the fixing temperature, compensation time and material parameters) for each fixing procedures are obtained under the boundary condition of shot-circuit. Experimental results are shown which are in qualitative agreement with the theory in L- H-L procedure.

Citation Download Citation

Shiuan-Huei Lin, Chao Ray Hsieh, Tai Chiung Hsieh, Ken Yuh Hsu, and Arthur E. T. Chiou "Optimum conditions for thermal fixing of volume holograms in Fe:LiNbO3", Proc. SPIE 3801, Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V, (20 September 1999); https://doi.org/10.1117/12.363921

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