Radiation and photochemistry of onium salt acid generators in chemically amplified resists

Seiichi Tagawa; Seiji Nagahara; Toshiyuki Iwamoto; Masanori Wakita; Takahiro Kozawa; Yukio Yamamoto; David Werst; Alexander D. Trifunac

doi:10.1117/12.388304

23 June 2000 Radiation and photochemistry of onium salt acid generators in chemically amplified resists

Seiichi Tagawa, Seiji Nagahara, Toshiyuki Iwamoto, Masanori Wakita, Takahiro Kozawa, Yukio Yamamoto, David Werst, Alexander D. Trifunac

Author Affiliations +

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388304
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The difference in photochemistry and radiation chemistry of sulfonium salt acid generator was investigated by product analysis and time resolved spectroscopic methods for chemically amplified resist application. After KrF excimer laser and electron beam irradiation of sulfonium salt, yields of decomposed products including acid were determined. The ultra fast in-cage reactions after laser irradiation were directly observed by the femtosecond laser flash photolysis method. Intermediates after electron beam irradiation were observed by nanosecond electron beam pulse radiolysis. From both the product analysis and time resolved spectroscopic methods, the contribution of each reaction pathway to acid generation was determined.

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Seiichi Tagawa, Seiji Nagahara, Toshiyuki Iwamoto, Masanori Wakita, Takahiro Kozawa, Yukio Yamamoto, David Werst, and Alexander D. Trifunac "Radiation and photochemistry of onium salt acid generators in chemically amplified resists", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388304

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