Foundry maskshop operation strategy and management

Chue-San Yoo; John C.H. Lin; Jia-Jing Wang

doi:10.1117/12.392084

19 July 2000 Foundry maskshop operation strategy and management

Chue-San Yoo, John C.H. Lin, Jia-Jing Wang

Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392084
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan

Abstract

To meet the ever-increasing demands from wafer fabs, a foundry maskshop is required to have an effective operation and management strategy so that its potential strengths are not diluted as it grows. Wafer foundry capacity increase could mean both increases in output capacity and the number of operation sites. In this paper, we will discuss the potential strengths of a foundry maskshop, strategy and management of it so as to embrace the challenges of the ever increasing demands from wafer foundry fabs in terms of technology, capacity and cycle time.

Citation Download Citation

Chue-San Yoo, John C.H. Lin, and Jia-Jing Wang "Foundry maskshop operation strategy and management", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); https://doi.org/10.1117/12.392084

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