PMMA deep etching by O2RIE

Aibin Yu; Guifu Ding; Xiaoyun Guo; Changmin Li; Haiping Mao; Zhiping Ni

doi:10.1117/12.408400

29 November 2000 PMMA deep etching by O₂RIE

Aibin Yu, Guifu Ding, Xiaoyun Guo, Changmin Li, Haiping Mao, Zhiping Ni

Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408400
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China

Abstract

The microstructures that have relatively large height, high aspect ratio are very important for improving micro-devices' characteristics. In this paper reactive ion etching (RIE) of PMMA to create high aspect ratio micro-structures was described. We use Ni film as mask, which was patterned by usual photochemical etching, then use O₂RIE technology to etch PMMA thick film (100 micrometers ). During the etching process, O₂ pressure, etching power are very important for the etching results. There are grass-like residues remained on the etched surface until the PMMA was over etched, this phenomena is caused by the micro-mask effect. With over etched, the grass-like residues can be eliminated. The etched surface is very smooth and the side wall is vertical. The etching depth can get up to higher than 100 (mu) M and the aspect ratio is 5.

Citation Download Citation

Aibin Yu, Guifu Ding, Xiaoyun Guo, Changmin Li, Haiping Mao, and Zhiping Ni "PMMA deep etching by O₂RIE", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408400

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