Paper
24 October 2000 Projection lenses for high-resolution ablation with excimer lasers: high-performance, wide-field and high-UV laser power
Johannes Schlichting, Kerstin Winkler, Lienhard Koerner, Thomas Schletterer, Berthold Burghardt, Hans-Juergen Kahlert
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Abstract
The productive and accurate ablation of microstructures demands the precise imaging of a mask pattern onto the substrate under work. The job can be done with high performance wide field lenses as a key component of ablation equipment. The image field has dimensions of 20 to 30 mm. Typical dimensions and accuracy of the microstructures are in the order of some microns. On the other hand, the working depth of focus (DOF) has to be in the order of some 10 microns to be successful on drilling through 20 to 50 μm substrates. All these features have to be reached under the conditions of high power laser UV light. Some design principles for such systems are applied, such as optimum number of elements, minimum tolerance sensitivity, material restrictions for the lens elements as well as mechanical parts (mounting), restrictions of possible power densities on lens surfaces (including ghosts), matched quality for the manufactures system. The special applications require appropriate performance criteria for theoretical calculation and measurements, which allow to conclude the performance of the application. The base is wave front calculation and measurement (using Shack- Hartmann sensor) in UV. Derived criteria are calculated and compared with application results.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Johannes Schlichting, Kerstin Winkler, Lienhard Koerner, Thomas Schletterer, Berthold Burghardt, and Hans-Juergen Kahlert "Projection lenses for high-resolution ablation with excimer lasers: high-performance, wide-field and high-UV laser power", Proc. SPIE 4093, Current Developments in Lens Design and Optical Systems Engineering, (24 October 2000); https://doi.org/10.1117/12.405225
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Excimer lasers

Laser ablation

Lenses

Wavefronts

Monochromatic aberrations

Tolerancing

Ultraviolet radiation

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