Paper
22 January 2001 ASIC data preparation management for OPC
Timothy G. Dunham, William C. Leipold
Author Affiliations +
Abstract
ASIC layout data, which can be large and typically with little hierarchy, can prove challenging for complex optical proximity correction (OPC) operations. Thoughtful coordination between the ASIC library designers and the OPC code developers in terms of design and execution methodologies can result in large savings in run time and additional hierarchy flattening with little or no impact to the library layout density. Results from such a collaboration on IBM’s 0.13um ASIC library resulted in better than order of magnitude improvement for gat e array library cell data preparation
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Timothy G. Dunham and William C. Leipold "ASIC data preparation management for OPC", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410686
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KEYWORDS
Optical proximity correction

Diffusion

Data processing

Diagnostics

Failure analysis

Inspection

Photomask technology

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