Atomic scale optical monitoring of the initial growth of TiO2 thin films

A. Niilisk; A. Rosental; A. Gerst; V. Sammelselg; T. Uustare

doi:10.1117/12.417579

8 March 2001 Atomic scale optical monitoring of the initial growth of TiO2 thin films

A. Niilisk, A. Rosental, A. Gerst, V. Sammelselg, T. Uustare

Proceedings Volume 4318, Smart Optical Inorganic Structures and Devices; (2001) https://doi.org/10.1117/12.417579
Event: Advanced Optical Materials and Devices, 2000, Vilnius, United States

Abstract

The initial atomic-layer-chemical-vapor-deposition growth of titanium dioxide from TiCl₄ and water on quartz glass substrates is monitored in real time by incremental dielectric reflection. An interesting means for bringing the growth from the very beginning into a time-homogeneous mode is proposed and preliminarily studied. It consists in an in situ TiCl₄-treatment procedure. The crystal structure and surface morphology of the prepared ultrathin films are characterized.

Citation Download Citation

A. Niilisk, A. Rosental, A. Gerst, V. Sammelselg, and T. Uustare "Atomic scale optical monitoring of the initial growth of TiO2 thin films", Proc. SPIE 4318, Smart Optical Inorganic Structures and Devices, (8 March 2001); https://doi.org/10.1117/12.417579

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