New measurement system for microscopic formtesting of microstructures by means of multiple-wavelength interferometry

Karsten Schneefuss; Tilo Pfeifer

doi:10.1117/12.445597

23 October 2001 New measurement system for microscopic formtesting of microstructures by means of multiple-wavelength interferometry

Karsten Schneefuss, Tilo Pfeifer

Author Affiliations +

Proceedings Volume 4400, Microsystems Engineering: Metrology and Inspection; (2001) https://doi.org/10.1117/12.445597
Event: Lasers in Metrology and Art Conservation, 2001, Munich, Germany

Abstract

Nowadays large area microstructured surfaces can be produced by innovative production technologies. The task for the measurement technologies is to cover the process chain during the production of these 3D-nano- and microstructures. At the Fraunhofer IPT the form of the structures is investigated because it determines the functionality of the components most significantly. Fast interferometrical measurement concepts are developed for the inspection of the surface. The possibilities of interferometrical formtesting of prisms, spherical lens arrays or gratings are adapted to the microscopic range. Especially for the characterization of gratings, the measurement range has been extended by using multiple wavelength interferometry.

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Karsten Schneefuss and Tilo Pfeifer "New measurement system for microscopic formtesting of microstructures by means of multiple-wavelength interferometry", Proc. SPIE 4400, Microsystems Engineering: Metrology and Inspection, (23 October 2001); https://doi.org/10.1117/12.445597

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