Noncontact electrical critical dimensions metrology sensor for chrome photomasks

Nadine Guillaume; Markku Lahti; Michael W. Cresswell; Richard A. Allen; Loren W. Linholm; Mona E. Zaghloul

doi:10.1117/12.458365

11 March 2002 Noncontact electrical critical dimensions metrology sensor for chrome photomasks

Nadine Guillaume, Markku Lahti, Michael W. Cresswell, Richard A. Allen, Loren W. Linholm, Mona E. Zaghloul

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458365
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

This paper describes a novel non-contact capacitive-sensor metrology tool developed for chrome photomasks. This work further describes suitable types of test structures printed on photomasks appropriate for linewidth metrology. The Critical Dimension (CD) metrology sensor is developed using a Low Temperature Co-Fired Ceramic (LTCC) technology to reduce the effects of parasitic capacitances. The sensor is based on non-contact micro-capacitance measurements of features on chrome-on-glass reticles. The CD-extraction algorithms based on the capacitance measurements are formulated from extensive evaluation with a Maxwell simulator. The purpose of the non-contact micro-capacitance sensor is to measure chrome-feature linewidths in the range of 0.4 (mu) M - 0.5 micrometers . These dimensions correspond to a 0.18 micrometers process on a 4X mask.

Citation Download Citation

Nadine Guillaume, Markku Lahti, Michael W. Cresswell, Richard A. Allen, Loren W. Linholm, and Mona E. Zaghloul "Noncontact electrical critical dimensions metrology sensor for chrome photomasks", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458365

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