Pattern generation with SLM imaging

Torbjoern Sandstrom; Per Askebjer; Jesper Sallander; Raoul Zerne; Andrzej Karawajczyk

doi:10.1117/12.458312

11 March 2002 Pattern generation with SLM imaging

Torbjoern Sandstrom, Per Askebjer, Jesper Sallander, Raoul Zerne, Andrzej Karawajczyk

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458312
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

Pattern generation founded on micro-mirror spatial light modulator (SLM) imaging presents a way to manage the decreasing feature sizes and increasing pattern complexities dictated by Moore's law. This paper identifies the critical elements of the imaging in the implementation of such a pattern generator. We show how the laser illumination, SLM chip, and optics collectively generate the image, and in particular, that these elements can be manufactured and integrated to specification. Expected deficiencies and variations in image quality are then effectively countered with calibration routines that bring final performance to within lithographic requirements, while also being manageable in design and turn-around-times.

Citation Download Citation

Torbjoern Sandstrom, Per Askebjer, Jesper Sallander, Raoul Zerne, and Andrzej Karawajczyk "Pattern generation with SLM imaging", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458312

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