Paper
15 October 2001 Fabrication of InGaAs/InGaAsP microcylinder by wet chemical etching
Yuzhai Pan, Yongqiang Ning, Li Qin, Hui Suo, Yun Liu, Lijun Wang
Author Affiliations +
Proceedings Volume 4601, Micromachining and Microfabrication Process Technology and Devices; (2001) https://doi.org/10.1117/12.444735
Event: International Symposium on Optoelectonics and Microelectronics, 2001, Nanjing, China
Abstract
The semiconductor microcylinder lasers with whispering-gallery modes are expected to be with execllent performances, such as low threshold current density and high efficiency. The spontaneous emission characteristics of microcylinder laser due to microcavity effect is strongly modified. Another excellence of whispering-gallery mode devices is that the probability of planar integration with waveguide devices and detectors. In this work InGaAs/InGaAsP microcylinder laser was fabricated by wet chemical etching. The diameter of the microcylinder is about 10micrometers or 5micrometers . With our improved processing the microcylinder was with smooth side wall, ensuring high Q-factor. The lasing at about 1.5micrometers was observed at low temperature.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuzhai Pan, Yongqiang Ning, Li Qin, Hui Suo, Yun Liu, and Lijun Wang "Fabrication of InGaAs/InGaAsP microcylinder by wet chemical etching", Proc. SPIE 4601, Micromachining and Microfabrication Process Technology and Devices, (15 October 2001); https://doi.org/10.1117/12.444735
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