PROCEEDINGS VOLUME 4691
SPIE'S 27TH ANNUAL INTERNATIONAL SYMPOSIUM ON MICROLITHOGRAPHY | 3-8 MARCH 2002
Optical Microlithography XV
Editor(s): Anthony Yen
Editor Affiliations +
SPIE'S 27TH ANNUAL INTERNATIONAL SYMPOSIUM ON MICROLITHOGRAPHY
3-8 March 2002
Santa Clara, California, United States
Image Quality Assessment
Bruce W. Smith, Julian S. Cashmore
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474562
Shuji Nakao, Shinroku Maejima, Shigenori Yamashita, Junji Miyazaki, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474580
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474590
Dongseok Nam, Eunmi Lee, Sung-gon Jung, Young S. Kang, Gisung Yeo, Junghyun Lee, Hanku Cho, Woo-Sung Han, Joo-Tae Moon
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474608
DRAM and Maskless Lithography
Yuping Cui, Franz X. Zach, Shahid A. Butt, Wai-Kin Li, Bernhard Liegl, Lars W. Liebmann
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474618
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474629
Joerg Thiele, Marco Ahrens, Wolfgang Dettmann, M. Heissmeier, Mario Hennig, Burkhard Ludwig, Molela Moukara, Rainer Pforr
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474639
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474474
Lithography Simulation and Analysis
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474483
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474490
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474500
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474509
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474519
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474529
OPC Techniques I
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474537
Toshiya Kotani, Sachiko Kobayashi, Hirotaka Ichikawa, Satoshi Tanaka, Susumu Watanabe, Soichi Inoue
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474546
Douglas J. Van Den Broeke, J. Fung Chen, Thomas L. Laidig, Stephen Hsu, Kurt E. Wampler, Robert John Socha, John S. Petersen
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474555
Kevin Lucas, Sergei V. Postnikov, Kyle Patterson, Chi-Min Yuan, Carla Nelson-Thomas, Matthew A. Thompson, Russell L. Carter, Lloyd C. Litt, Patrick K. Montgomery, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474563
Process Optimization and Control I
Jo Finders, Robert de Kruif, Richard Bruls, Igor Bouchoms
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474571
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474573
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474575
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474576
Process Optimization and Control II
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474577
Changan Wang, Simon Chang, Mark A. Boehm
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474578
Jan B.P. van Schoot, Oscar Noordman, Peter Vanoppen, Frans Blok, Donggyu Yim, Chan-Ha Park, Byeong-Ho Cho, Thomas Theeuwes, Young-Hong Min
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474579
Bruno M. La Fontaine, Mircea V. Dusa, Jouke Krist, Alden Acheta, Jongwook Kye, Harry J. Levinson, Carlo Luijten, Craig B. Sager, Jack J. Thomas, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474581
Alternating PSM Implementation
Christophe Pierrat, Michel L. Cote, Kyle Patterson
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474582
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474583
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474585
OPC Techniques II
Chul-Hong Park, Sang-Uhk Rhie, Soo-Han Choi, Dong-Hyun Kim, Ji-Soong Park, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474586
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474587
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474589
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474591
Additional Paper from Session 9
Resolution Enhancement Techniques I
Michael Fritze, Brian Tyrrell, Susan G. Cann, Chris Carney, Betty Ann Blachowicz, David J. Brzozowy, Thomas Kocab, Scott Bowdoin, Peter D. Rhyins, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474592
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474593
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474594
Resolution Enhancement Techniques II
Insung Kim, Sung-gon Jung, Hyung-Do Kim, Gisung Yeo, In-Gyun Shin, Junghyun Lee, Hanku Cho, Joo-Tae Moon
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474595
Stephen Hsu, Noel P. Corcoran, Mark Eurlings, William T. Knose, Thomas L. Laidig, Kurt E. Wampler, Sabita Roy, Xuelong Shi, Chungwei Michael Hsu, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474596
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474599
Mask-related Issues
Poster Session
Andrew Grenville, Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, Roger H. French, Robert C. Wheland, Xun Zhang, Joe Gordan
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474604
157-nm Lithography
Roger H. French, Robert C. Wheland, Weiming Qiu, M. F. Lemon, Gregory S. Blackman, Xun Zhang, Joe Gordon, Vladimir Liberman, A. Grenville, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474605
Toshifumi Suganaga, Noriyoshi Kanda, J. Kim, Osamu Yamabe, Kunio Watanabe, Takamitsu Furukawa, Seiro Miyoshi, Toshiro Itani, Julian S. Cashmore, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474606
Naomasa Shiraishi, Soichi Owa, Yasuhiro Ohmura, Takashi Aoki, Yukako Matsumoto, Jin Nishikawa, Issei Tanaka
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474607
Hideki Nogawa, Hideo Hata, Michio Kohno
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474609
Jan Mulkens, Thomas J. Fahey, James A. McClay, Judon M. D. Stoeldraijer, Patrick Wong, Martin Brunotte, Birgit Mecking
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474610
Exposure Tools and Subsystems I
James E. Webb, Timothy Rich, Anthony R. Phillips, James D. Cornell
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474611
Koen van Ingen Schenau, Hans Bakker, Mark Zellenrath, Richard Moerman, Jeroen Linders, Thomas Rohe, Wolfgang Emer
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474612
Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Masayuki Konishi, Takashi Suganuma, Masaki Nakano, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474613
Klaus Vogler, Ingo Klaft, Frank Voss, Igor Bragin, Elko Bergmann, Tamas Nagy, Norbert Niemoeller, Stefan Spratte, Rainer Paetzel, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474614
Exposure Tools and Subsystems II
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474615
Yuji Chiba, Kazuhiro Takahashi
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474616
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474617
Rian Rubingh, Youri van Dommelen, Sjef Tempelaars, Marc Boonman, Roger Irwin, Edwin van Donkelaar, Hans Burgers, Guustaaf Savenaije, Bert Koek, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474619
Contamination Issues in Lithography
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474620
Jeff Meute, Georgia K. Rich, Stefan Hien, Kim R. Dean, Carolyn Gondran, Julian S. Cashmore, Dominic Ashworth, James E. Webb, Lisa R. Rich, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474621
Yasuaki Fukuda, Seiji Takeuchi, Takashi Aoki, Hiroyuki Nagasaka, Soichi Owa, Fumika Yoshida, Youichi Kawasa, Keiji Egawa, Takehito Watanabe, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474622
Uzodinma Okoroanyanwu, Peter Kunze, Katharina H.B. Al-Shamery, Jeremias Romero, Joffre Bernard
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474623
Process Optimization and Control II
Sri Satyanarayana, Ken Brennan, Thieu Jacobs, Richard Berger
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474624
Poster Session
Shuji Nakao, Shinroku Maejima, Naohisa Tamada, Shigenori Yamashita, Atsushi Ueno, Junji Miyazaki, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474625
Michael T. Reilly, Colin R. Parker, Frank W. Fischer, Todd Hiar
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474626
Sang-Kon Kim, Ji-Yong Yoo, Hye-Keun Oh
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474627
Tsuneyuki Hagiwara, Masato Hamatani, Hideyuki Tashiro, Etsuya Morita, Shinichi Okita, Naoto Kondo
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474628
Tadahito Fujisawa, Masafumi Asano, T. Sutani, Soichi Inoue, Hiroaki Yamada, Junji Sugamoto, Katsuya Okumura, Tsuneyuki Hagiwara, Satoshi Oka
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474630
Cheol-Kyu Bok, Seok-Kyun Kim, Hee-Bom Kim, Jin-Sung Oh, Chang-Nam Ahn, Ki-Soo Shin
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474631
Scott W. Jessen, K. Steiner, Thomas M. Wolf, William D. Josephson, S. Lytle, Mitsuru Sato, Chung Yih Lee, Ming Hui Fan
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474632
Byeong-Ho Cho, Donggyu Yim, Chan-Ha Park, Seung-Hyuk Lee, Hyun-Jo Yang, Jae-Hak Choi, Yong-Chul Shin, Choi-Dong Kim, Jae-Sung Choi, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474633
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474634
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474635
Lori Anne Joesten, Michael T. Reilly, Jason DeSisto, Christiane Jehoul
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474636
Tsuneyuki Hagiwara, Masato Hamatani, Naoto Kondo, Kosuke Suzuki, Hisashi Nishinaga, Jiro Inoue, Koji Kaneko, Shunichi Higashibata
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474637
Shangting F. Detweiler, Simon Chang, Sandra Zheng, Patrick Gagnon, Christopher C. Baum, Mark A. Boehm, Jay M. Brown, Catherine H. Fruga
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474638
Katrin Reblinksy, Tobias Bach, Steffen F. Schulze, Martin I. Commons
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474640
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474641
David P. Mancini, Steven M. Smith, Andrew F. Hooper, A. Talin, Daniel Chang, Douglas J. Resnick, Steven A. Voight
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474642
Shuji Nakao, Shinroku Maejima, Atsushi Ueno, Shigenori Yamashita, Junji Miyazaki, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474643
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474644
Arief Suriadi, Frank Berauer, Akari Yasunaga, Alfred I-Tsung Pan, Hubert A. Vander Plas
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474645
Chieh-yu Lin, Karen E. Petrillo, David Dobuzinsky
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474646
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474475
Scott P. Warrick, Paul C. Hinnen, Richard J. F. van Haren, Chris J. Smith, Henry J. L. Megens, Chong-Cheng Fu
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474476
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474477
Douglas A. Bernard, Jiangwei Li
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474478
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474479
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474480
Kyle Patterson, Lloyd C. Litt, John G. Maltabes, Greg P. Hughes, Trish Robertson, B. Montgomery
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474481
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474482
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474484
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474485
Kohji Hashimoto, Tatsuaki Kuji, Shingo Tokutome, Toshiya Kotani, Satoshi Tanaka, Soichi Inoue
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474486
Maharaj Mukherjee, Vinhthuy Phan
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474487
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474488
Ralph E. Schlief, Armin Liebchen, J. Fung Chen
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474491
Sergei V. Postnikov, Kevin Lucas, Karl Wimmer, Vladimir Ivin, Andrey Rogov
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474492
Andrew Khoh, Tomas D. Milster, Byoung-Il Choi, Ganesh S. Samudra, Yihong Wu
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474493
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474494
Hiroki Futatsuya, Tatsuo Chijimatsu, Minami Takayoshi, Ryo Tsujimura, Yoshihisa Komura, Yoshio Ito, Satoru Asai
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474495
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474496
Bernd Tollkuehn, Andreas Erdmann, Niko Kivel, Stewart A. Robertson, Doris Kang, Steven G. Hansen, Anita Fumar-Pici, Tsann-Bim Chiou, Wolfgang Hoppe
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474497
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474499
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474501
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474502
Shih-Ying Chen, Eric C. Lynn
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474503
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474504
Keiko T. Hattori, Jun Abe, Hiroshi Fukuda
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474505
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474506
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474507
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474508
Ji-Yong Yoo, Yeong-Keun Kwon, Jun-Taek Park, Dong-Soo Sohn, Sang-Gon Kim, Young-Soo Sohn, Hye-Keun Oh
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474510
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474511
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474512
Thomas H. Newman, Jan M. Chabala, B.J. Marleau, Frederick Raymond III, Olivier Toublan, Mark A. Gesley, Frank E. Abboud
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474514
Bryan S. Kasprowicz, Richard Priestley, Michael R. Heslin, David R. Fladd
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474515
Andrew Rudack, Lawrence Levit, Alvina M. Williams
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474516
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474517
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474518
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474520
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474521
Seok-Hwan Oh, Hyoungkook Kim, Dae-Joung Kim, Young-Seok Kim, Chun-Suk Suh, Yong-Sun Koh, Chang-Lyong Song
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474522
Peter Dirksen, Joseph J. M. Braat, Peter De Bisschop, Guido C.A.M. Janssen, Casper A. H. Juffermans, Alvina M. Williams
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474523
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474524
Chang-Moon Lim, Jung-Ho Song, Sung-Soo Woo, Ki-Sung Kwon, Chang-Nam Ahn, Ki-Soo Shin
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474525
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474526
Seiji Matsuura, Takeo Hashimoto
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474527
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474528
Yoshihiro Shiode, Shuuichi Okada, Hiroki Takamori, Hideki Matsuda, Sachiko Fujiwara
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474530
Tae Moon Jeong, Seong-Woon Choi, Sang-Gyun Woo, Woo-Sung Han, Jung-Min Sohn
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474531
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474532
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474533
Dong-Hoon Chung, Jean-Young Park, Man-Ki Lee, In-Gyun Shin, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn, J. Fung Chen, Douglas J. Van Den Broeke
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474534
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474535
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474536
Elise Baylac Boissard, Christophe M. Brault, Jin Wuk Sung
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474538
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474539
Yeong-Song Yen, I-Hsiung Huang, Jiunn-Ren Huang, Kuei-Chun Hung, Chi-fa Ku, Ching-Hsu Chang, Cheng Yu Fang, Paul P.W. Yen
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474540
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474541
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474542
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474544
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474545
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474547
Shuji Nakao, Shinji Tarutani, Ayumi Minamide, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474548
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474549
Ryuji Biro, Kazuho Sone, Shunsuke Niisaka, Minoru Otani, Yasuyuki Suzuki, Chidane Ouchi, Tadahiko Saito, Masanobu Hasegawa, Jun Saito, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474550
Bruce W. Smith, Will Conley, Cesar M. Garza Sr., Jeff Meute, Daniel A. Miller, Georgia K. Rich, Victoria L. Graffenberg, Kim R. Dean, Shashikant Patel, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474551
157-nm Lithography
Vladimir Liberman, Mordechai Rothschild, Stephen T. Palmacci, N. N. Efremow Jr., Jan H. C. Sedlacek, A. Grenville
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474552
Poster Session
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474553
Osamu Yamabe, Noboru Uchida, Toshiro Itani
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474554
Horst Schreiber, Paul G. Dewa, K. Hanford, Robert Ligenza, Lisa R. Rich, Paul Jay Tompkins
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474556
Akira Sumitani, Yasuo Itakura, Fumika Yoshida, Youichi Kawasa, Jing Zhang, Noriyoshi Kanda, Toshiro Itani
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474557
SungKwan Kim, Eunchul Choi, Hyoungdo Kim, Jungmin Kim, Kwangsoo No
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474558
Gerald Fuetterer, Waltraud Herbst, Joerg Rottstegge, Margit Ferstl, Michael Sebald, Johannes Schwider
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474559
Takanori Nakaike, Osamu Wakabayashi, Toru Suzuki, Hakaru Mizoguchi, Kiyoharu Nakao, Ryoichi Nohdomi, Tatsuya Ariga, Naoki Kitatochi, Takashi Suganuma, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474560
Wolfgang Zschocke, Hans Stephen Albrecht, Thomas Schroeder, Igor Bragin, Peter Lokai, Farid Seddighi, Christian Reusch, Anna Cortona, Kai Schmidt, et al.
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474561
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474564
Klaus R. Mann, G. Eckert, Christian Goerling, Uwe Leinhos, Bernd Schaefer
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474565
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474566
Choonghoon Oh, Vladimir B. Fleurov, Thomas Hofmann, Thomas P. Duffey, F. Trintchouk, Patrick O'Keeffe, Peter C. Newman, Gerry M. Blumenstock
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474567
Resolution Enhancement Techniques I
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474568
Resolution Enhancement Techniques II
Poster Session
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474570
Martin Letz, W. Mannstadt, Matthias Brinkmann, Ewald Moersen
Proceedings Volume Optical Microlithography XV, (2002) https://doi.org/10.1117/12.474572
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