High-sensitivity two-photon photoacid generator for three-dimensional microfabrication

Stephen M. Kuebler; Kevin Braun; Wenhui Zhou; Tianyue Yu; J. Kevin Cammack; Christopher Kemper Ober; Seth R. Marder; Joseph W. Perry

doi:10.1117/12.453776

4 November 2002 High-sensitivity two-photon photoacid generator for three-dimensional microfabrication

Stephen M. Kuebler, Kevin Braun, Wenhui Zhou, Tianyue Yu, J. Kevin Cammack, Christopher Kemper Ober, Seth R. Marder, Joseph W. Perry

Author Affiliations +

Proceedings Volume 4809, Nanoscale Optics and Applications; (2002) https://doi.org/10.1117/12.453776
Event: International Symposium on Optical Science and Technology, 2002, Seattle, WA, United States

Abstract

A new photoacid generator (PAG) is described that can be efficiently activated by two-photon excitation and can be used for high-sensitivity three-dimensional micro-patterning of acid-sensitive media. The molecule has a large two-photon absorption cross section that peaks near 705 nm (δ = 690 x 10^-50 cm⁴ s photon^-1) and a high quantum yield for the photochemical generation of acid (φ_H+ ≈ 0.5). Under near-infrared laser irradiation, the molecule produces acid subsequent to two-photon excitation and initiates the polymerization of epoxides at an incident intensity that is one to two orders of magnitude lower than that needed for conventional ultraviolet-sensitive initiators. The new PAG was used in conjunction with the solid epoxide resist Epon SU-8 for negative-tone three-dimensional microfabrication.

Citation Download Citation

Stephen M. Kuebler, Kevin Braun, Wenhui Zhou, Tianyue Yu, J. Kevin Cammack, Christopher Kemper Ober, Seth R. Marder, and Joseph W. Perry "High-sensitivity two-photon photoacid generator for three-dimensional microfabrication", Proc. SPIE 4809, Nanoscale Optics and Applications, (4 November 2002); https://doi.org/10.1117/12.453776

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