Process Control For Sputter Deposition Of Low Emissivity Films In Large Scale Production

Roy L. Bernardi; Steven J. Nadel

doi:10.1117/12.944781

2 November 1984 Process Control For Sputter Deposition Of Low Emissivity Films In Large Scale Production

Roy L. Bernardi, Steven J. Nadel

Proceedings Volume 0502, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion III; (1984) https://doi.org/10.1117/12.944781
Event: 28th Annual Technical Symposium, 1984, San Diego, United States

Abstract

Low emissivity coatings for commercial and residential construction uses are being produced every day on large scale, in-line sputter deposition systems. Under full production conditions, this equipment is capable of producing millions of square feet per year, of quality coatings, on glass sheets as large as 100" x 144". Heat mirror coatings of the dielectric sandwich type, with silver as the metal layer, present a special challenge in process control. To maintain emissivities below 0.15 requires delicate control of deposition conditions. Small variations in layer thicknesses can have dramatic effects on overall coating performance and characteristics. Film and glass side reflective color are especially sensitive to layer thickness variation. An indication of the effects of varying layer thicknesses on reflective color is included.

Citation Download Citation

Roy L. Bernardi and Steven J. Nadel "Process Control For Sputter Deposition Of Low Emissivity Films In Large Scale Production", Proc. SPIE 0502, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion III, (2 November 1984); https://doi.org/10.1117/12.944781

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