Compact electron-based extreme-ultraviolet source at 13.5 nm

Andre Egbert; Bjoern Mader; Boris Tkachenko; Andreas Ostendorf; Boris N. Chichkov; Thomas Missalla; Max Christian Schuermann; Kai Gaebel; Guido Schriever; Uwe Stamm

doi:10.1117/12.482366

16 June 2003 Compact electron-based extreme-ultraviolet source at 13.5 nm

Andre Egbert, Bjoern Mader, Boris Tkachenko, Andreas Ostendorf, Boris N. Chichkov, Thomas Missalla, Max Christian Schuermann, Kai Gaebel, Guido Schriever, Uwe Stamm

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.482366
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Generation of extreme ultraviolet (EUV) radiation from solid targets is studied and a compact EUV source for small-scale lithographic applications and EUV metrology is development. This source is based on a transfer of conventional x-ray tube technology into the EUV spectral range. As in an ordinary x-ray tube, electrons are generated by a tungesten filament and accelerated in a high-voltage electric field towards a solid target. In the demonstrated "EUV tube" beryllium and silicon targets are used to generate radiation at 11.4 nm and 13.5 nm, respectively. The absolute converstion efficiencies into EUV photons are measured. At 13.5 nm an EUV power of 34μW or 2×10¹² photon/s (in 2% bandwidth and a solid angle of 2π sr) is demonstrated. Prospects for a further power scaling of the EUV source are discussed.

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Andre Egbert, Bjoern Mader, Boris Tkachenko, Andreas Ostendorf, Boris N. Chichkov, Thomas Missalla, Max Christian Schuermann, Kai Gaebel, Guido Schriever, and Uwe Stamm "Compact electron-based extreme-ultraviolet source at 13.5 nm", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.482366

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