PEB sensitivity studies of ArF resist

SangHo Lee; Woo-Kyu Kim; Dalil Rahman; Takanori Kudo; Allen Timko; Clement Anyadiegwu; Douglas S. McKenzie; Takashi Kanda; Ralph R. Dammel; Munirathna Padmanaban

doi:10.1117/12.485183

12 June 2003 PEB sensitivity studies of ArF resist

SangHo Lee, Woo-Kyu Kim, Dalil Rahman, Takanori Kudo, Allen Timko, Clement Anyadiegwu, Douglas S. McKenzie, Takashi Kanda, Ralph R. Dammel, Munirathna Padmanaban

Author Affiliations +

Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003) https://doi.org/10.1117/12.485183
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

In an effort to develop a production-worthy 193-resist, it is important to understand the critical factors that impacts the CD variation during a routine photo lithographic process. A comprehensive investigation was done on factors affecting PEB sensitivity in ArF resist system. The areas of interest are polymer components, PAGs, bases, and photo lithographic process. In order to understand effects of the PAGs on PEB sensitivity, a number of PAGs possessing different types of cations and anions were investigated. Sulfonium type cations and acids with longer alkyl chains were found to be effective in reducing the PEB sensitivity. Influence of lithography process conditions was also studied on the PEB sensitivity. Increasing the soft bake (SB) temperature and decreasing the post exposure bake (PEB) temperature reduced the PEB sensitivity but mostly at the expense of line-edge roughness (LER). This paper presents our findings of the critical factors affecting PEB sensitivity and describes improved lithographic results of an optimized experimental formulation. In addition, delay effects after coating, soft bake, exposure, and post exposure bake (PEB) were also investigated and these results are included.

Citation Download Citation

SangHo Lee, Woo-Kyu Kim, Dalil Rahman, Takanori Kudo, Allen Timko, Clement Anyadiegwu, Douglas S. McKenzie, Takashi Kanda, Ralph R. Dammel, and Munirathna Padmanaban "PEB sensitivity studies of ArF resist", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485183

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available