Transcriptional ablation using femtosecond laser with mask

Yoshiki Nakata; Tatsuo Okada; Mitsuo Maeda

doi:10.1117/12.540518

18 November 2003 Transcriptional ablation using femtosecond laser with mask

Yoshiki Nakata, Tatsuo Okada, Mitsuo Maeda

Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.540518
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany

Abstract

Mask patterns in the shape of lines were transferred on gold thin films by laser ablation using femtosecond laser and a photo-lithographic optical system. A laser beam passed through a mask and the pattern was imaged on the film by a pair of convex lenses. As a result, the film was lithographically ablated, and microsized patterns were generated in a single shot. Fringes were generated outside the ablated patterns with defocusing or larger laser fluence. The resolution of generation was 13 μm, and the narrowest width of a generated line was about 4 μm actually.

Citation Download Citation

Yoshiki Nakata, Tatsuo Okada, and Mitsuo Maeda "Transcriptional ablation using femtosecond laser with mask", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); https://doi.org/10.1117/12.540518

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