Paper
29 April 2003 Nanopatterning by AFM nano-oxidation of thin aluminum layers as a tool for the prototyping of nanoelectromechanical systems
Cristina Martin, Zachary Davis, Esko Forsen, Migdong Dong, Josep Montserrat, Gabriel Abadal, Francesc Perez-Murano, Xavier Borrise, Anja Boisen, Núria Barniol
Author Affiliations +
Proceedings Volume 5118, Nanotechnology; (2003) https://doi.org/10.1117/12.501262
Event: Microtechnologies for the New Millennium 2003, 2003, Maspalomas, Gran Canaria, Canary Islands, Spain
Abstract
Nanolithography based on atomic force microscopy is a widely used techniques for the prototyping of nanostructures. This technique has attracted great attention due to its simplicity, versatility and precise control. Oxidation is performed at normal atmosphere where the meniscus connecting tip and surface plays a key role. The present study describes the electrical conductivity of this nanometer-size meniscus. By acquiring force vs distance curves, we determine the relationship between the tip-surface separation and electrical current. It is observed an increase of the electrical current at small finite separations (< 2 nm) due to a change in water meniscus properties, and a decrease of electrical current when the meniscus is elongated.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Cristina Martin, Zachary Davis, Esko Forsen, Migdong Dong, Josep Montserrat, Gabriel Abadal, Francesc Perez-Murano, Xavier Borrise, Anja Boisen, and Núria Barniol "Nanopatterning by AFM nano-oxidation of thin aluminum layers as a tool for the prototyping of nanoelectromechanical systems", Proc. SPIE 5118, Nanotechnology, (29 April 2003); https://doi.org/10.1117/12.501262
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KEYWORDS
Silicon

Oxidation

Aluminum

Atomic force microscopy

Nanolithography

Nanoelectromechanical systems

Nanostructures

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