New development method eliminating the loading and microloading effect

Kotaro Ooishi; Yukihiko Esaki; Kazuo Sakamoto; Hideaki Sakurai; Masamitsu Itoh; Mika Nakao; Toshiharu Nishimura; Hiroyuki Miyashita; Naoya Hayashi; Shinji Tanabe; Yoshihisa Oosaki; Yasuyoshi Sasagawa

doi:10.1117/12.504050

28 August 2003 New development method eliminating the loading and microloading effect

Kotaro Ooishi, Yukihiko Esaki, Kazuo Sakamoto, Hideaki Sakurai, Masamitsu Itoh, Mika Nakao, Toshiharu Nishimura, Hiroyuki Miyashita, Naoya Hayashi, Shinji Tanabe, Yoshihisa Oosaki, Yasuyoshi Sasagawa

Author Affiliations +

Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504050
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan

Abstract

In recent years, more precise pattern dimension control (CD control) on a photomask has been required than ever as finer-line of IC pattern progresses. In the case of the conventional development (spray-development, puddle-development), CD control is difficult due to loading and micro-loading effect. The "loading and micro-loading effect" refers to the differences of exposed area around the pattern. The low pattern density generates numerous dissolution products and decreases the concentration of developer. This phenomenon changes resist dissolution rate and causes difficulties in controlling the CD. To solve this problem, we have been developing a new type of developer, called "Proximity Gap Suction Development (PGSD)." Nozzle of PGSD has five slits; opening for supplying developer is in the center, two suction slits are on the both sides, and two slits for rinse are on the very end. The proximity gap is kept between the nozzle surface and resist during development. Contaminated developer is immediately sucked/removed and stable development can be achieved by the continuous dispense of fresh developer at high speed. Thus, a desired pattern size can be obtained without loading and micro loading effect. We reported the principle of PGSD at BACUS in 2002. In this thesis, we would like to report the following topics. (1) System overview of α machine, which we are currently developing. (2) Effect of the PGSD on CD uniformity and the number of defects.

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Kotaro Ooishi, Yukihiko Esaki, Kazuo Sakamoto, Hideaki Sakurai, Masamitsu Itoh, Mika Nakao, Toshiharu Nishimura, Hiroyuki Miyashita, Naoya Hayashi, Shinji Tanabe, Yoshihisa Oosaki, and Yasuyoshi Sasagawa "New development method eliminating the loading and microloading effect", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504050

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