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28 August 2003 Photomask and lithography technologies: past 10 years and what will come next
Koichiro Hoh
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Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504045
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan
Abstract
On the occasion of 10th conference of Photomask Japan, the advancement of this conference in the past decade is briefly reviewed and some emerging technologies related to lithography are discussed with examples.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Koichiro Hoh "Photomask and lithography technologies: past 10 years and what will come next", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504045
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KEYWORDS
Photomasks
Lithography
Microelectromechanical systems
Very large scale integration
X-rays
Radio frequency circuits
Silicon
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