Paper
25 February 2004 Optical metrology of thin films using high-accuracy spectrophotometric measurements with oblique angles of incidence
Saulius Nevas, Farshid Manoocheri, Erkki Ikonen, Alexander V. Tikhonravov, Michail A. Kokarev, Michail K. Trubetskov
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Abstract
Oblique-incidence spectrophotometric measurements are considered for reliable determination of the refractive index and thickness of thin-film coatings. By using a model of the spectral transmittance of thin film samples, the effect of systematic factors on the determined thin-film parameters is analyzed. The optical parameters of a silicon-dioxide sample determined from the experimental results obtained with the HUT spectrophotometer are consistent for the incidence angles between 0 and 56.4 degrees, demonstrating high accuracy of film-parameter determination.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Saulius Nevas, Farshid Manoocheri, Erkki Ikonen, Alexander V. Tikhonravov, Michail A. Kokarev, and Michail K. Trubetskov "Optical metrology of thin films using high-accuracy spectrophotometric measurements with oblique angles of incidence", Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); https://doi.org/10.1117/12.512700
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Cited by 5 scholarly publications.
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KEYWORDS
Transmittance

Thin films

Refractive index

Spectrophotometry

Collimation

Optical testing

Polarization

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