Paper
17 November 2003 Chromatic monitoring technique for thickness measurement of thin transparent films
Author Affiliations +
Proceedings Volume 5258, IV Workshop on Atomic and Molecular Physics; (2003) https://doi.org/10.1117/12.544680
Event: IV Workshop on Atomic and Molecular Physics, 2002, Jurata, Poland
Abstract
The main topic of this work is the development and optimization of a new measurement method used for in-situ thickness monitoring of thin films grown using plasma. Because of their inherent limitations, measurements methods described in literature cannot be used during the low-temperature plasma processes as they are sensitive to optical noise generated by plasma and the substrate heater. To address this problem, a new method, based on chromatic sensor, has been developed. The monitored film is illuminated by polychromatic light which interferes in it, is reflected from it and collected by three detectors with spectral responsivities coincided with human eye. Based on signals from these detectors and known relationship between the spectrum of the reflected light and the thickness of the film, it is possible to monitor the thickness of the film in real time.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert Bogdanowicz "Chromatic monitoring technique for thickness measurement of thin transparent films", Proc. SPIE 5258, IV Workshop on Atomic and Molecular Physics, (17 November 2003); https://doi.org/10.1117/12.544680
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KEYWORDS
Thin films

Colorimetry

Plasma

Sensors

Signal detection

Reflectivity

Modulation

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