Short and ultrashort laser pulses: an upcoming tool for processing optical and semiconductor materials

Christian J. Kulik

doi:10.1117/12.541437

15 July 2004 Short and ultrashort laser pulses: an upcoming tool for processing optical and semiconductor materials

Christian J. Kulik

Proceedings Volume 5339, Photon Processing in Microelectronics and Photonics III; (2004) https://doi.org/10.1117/12.541437
Event: Lasers and Applications in Science and Engineering, 2004, San Jose, Ca, United States

Abstract

Laser beam sources emitting pulses with durations in the regime between nano- and femtoseconds are winning more and more importance for processing optical and semiconductor materials. Beneath lithography, etching and coating, laser technology is necessary to support the production of innovative electronic and optical devices. Finest structures, cuts and drillings can be manufactured in a high variety of materials like silicon, glasses but also in composite materials like polymers. In this paper a survey on a number of laser based processes for microelectronic and optoelectronic manufacturing is presented. With regard to this context effects and material interactions are discussed and attached to different laser beam sources. The quality of processes as well as their economical meaning from perspective of laser technology is evaluated. An overview about machining and actual trends for ns-, upcoming ps- and fs-laser technology are presented.

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Christian J. Kulik "Short and ultrashort laser pulses: an upcoming tool for processing optical and semiconductor materials", Proc. SPIE 5339, Photon Processing in Microelectronics and Photonics III, (15 July 2004); https://doi.org/10.1117/12.541437

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