Ion-assist applications of broad-beam ion sources

Harold R. Kaufman; James M.E. Harper

doi:10.1117/12.559785

29 September 2004 Ion-assist applications of broad-beam ion sources

Harold R. Kaufman, James M.E. Harper

Proceedings Volume 5527, Advances in Thin Film Coatings for Optical Applications; (2004) https://doi.org/10.1117/12.559785
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

Ion-assist applications of broad-beam ion sources are reviewed for ion energies up to about 1 keV. These applications are organized by ion energy and cover a wide range of thin-film technologies. Optimum ion-assist doses are described when available. Except for applications that benefit from specific ion energies, the majority of ion-assist applications are probably done best in the low-energy range that extends from about 25 eV to 100 eV.

Citation Download Citation

Harold R. Kaufman and James M.E. Harper "Ion-assist applications of broad-beam ion sources", Proc. SPIE 5527, Advances in Thin Film Coatings for Optical Applications, (29 September 2004); https://doi.org/10.1117/12.559785

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available