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In connection with the manufacture of OVONYXTM multilayer x-ray optical elements, investigations have been carried out into the effects of various types of layer imperfections on the x-ray optical properties of multilayers. These have included extensive numerical modeling of real multilayers (using a computational scheme based on the complete dynamical theory) including simulations of interface diffusion, deviations from constant d-spacing, and interface roughness. Results are presented for several examples of Hf-Si and W-Si multilayers, including comparison of measurements at Cu-Kato the theoretical model.
James L. Wood,Nicola J. Grupido,Keith L. Hart,Steven A. Flessa,Alan M. Kadin,John E. Keem, andDavid H. Ferris
"Measured X-ray Performance of Synthetic Multilayers Compared To Calculated Effects of Layer Imperfection", Proc. SPIE 0563, Applications of Thin Film Multilayered Structures to Figured X-Ray Optics, (6 May 1985); https://doi.org/10.1117/12.949672
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James L. Wood, Nicola J. Grupido, Keith L. Hart, Steven A. Flessa, Alan M. Kadin, John E. Keem, David H. Ferris, "Measured X-ray Performance of Synthetic Multilayers Compared To Calculated Effects of Layer Imperfection," Proc. SPIE 0563, Applications of Thin Film Multilayered Structures to Figured X-Ray Optics, (6 May 1985); https://doi.org/10.1117/12.949672