Short and ultrashort laser pulses: application-driven comparison of source types

Christian J. Kulik; Andreas Ostendorf

doi:10.1117/12.596594

8 October 2004 Short and ultrashort laser pulses: application-driven comparison of source types

Proceedings Volume 5662, Fifth International Symposium on Laser Precision Microfabrication; (2004) https://doi.org/10.1117/12.596594
Event: Fifth International Symposium on Laser Precision Microfabrication, 2004, Nara, Japan

Abstract

Beneath lithography, etching and coating, laser technology is necessary to support the production of innovative devices in MEMS, electronic and optical industry. Laser beam sources emitting pulses with durations in the regime between nano- and femtoseconds are winning more and more importance for processing metal, semiconductor and optical materials. Finest structures, cuts and drilings can be manufactured in a high variety of materials like silicon, glasses but also in composite materials like polymers. In this paper a survey on a number of laser based processes for precision manufacturing is presented. With regard to this context, effects and material interactions are discussed and attached to different laser beam sources. The quality of processes as well as their economical meaning from perspective of laser technology is evaluated. An overview about machining and actual trends for ns-, upcoming ps- and fs-laser technology is presented.

Citation Download Citation

Christian J. Kulik and Andreas Ostendorf "Short and ultrashort laser pulses: application-driven comparison of source types", Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); https://doi.org/10.1117/12.596594

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