Study on high-accuracy displacement interferometer for lithography application

Zhaogu Cheng; Haijun Gao; Xiongliang Chai; Zhigao Ning; Huijie Huang

doi:10.1117/12.596381

8 October 2004 Study on high-accuracy displacement interferometer for lithography application

Zhaogu Cheng, Haijun Gao, Xiongliang Chai, Zhigao Ning, Huijie Huang

Proceedings Volume 5662, Fifth International Symposium on Laser Precision Microfabrication; (2004) https://doi.org/10.1117/12.596381
Event: Fifth International Symposium on Laser Precision Microfabrication, 2004, Nara, Japan

Abstract

A measurement interferometer available for wafer stage metrology of lithography has been investigated by means of resolution-extending of optical subdivision based on commercial interferometers. Factors that determine the accuracy, linearity and repeatability of nanometer-scale measurements of displacements exceeding hundreds of millimeters and of target velocities exceeding hundreds of millimeters per second are also discussed.

Citation Download Citation

Zhaogu Cheng, Haijun Gao, Xiongliang Chai, Zhigao Ning, and Huijie Huang "Study on high-accuracy displacement interferometer for lithography application", Proc. SPIE 5662, Fifth International Symposium on Laser Precision Microfabrication, (8 October 2004); https://doi.org/10.1117/12.596381

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