Fabrication of magnetic nanostructures and devices by AFM nanolithography technique

Yasushi Takemura; Jun-ichi Shirakashi

doi:10.1117/12.607266

8 December 2004 Fabrication of magnetic nanostructures and devices by AFM nanolithography technique

Yasushi Takemura, Jun-ichi Shirakashi

Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.607266
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China

Abstract

Magnetic nanostructures and devices were fabricated by a combination of conventionally photo or electron beam lithography and atomic force microscopy (AFM) lithography. Ni- and Co(Fe)-based nanostructures of oxide were successfully fabricated by applying a negative pulse voltage to the AFM cantilever. Both of height and width of the oxide nanostructures were controlled by changing the applied bias voltage to the cantilever. Ni/Ni-oxide planar-type magnetic tunnel junctions were fabricated by this technique and the current-voltage curve exhibited a diode characteristic. It was also found that magnetic domain structures were controlled by the AFM nano-oxidation. This nanolithography is a promising technique for fabricating magnetic nanostructures for quantum devices and new functional materials.

Citation Download Citation

Yasushi Takemura and Jun-ichi Shirakashi "Fabrication of magnetic nanostructures and devices by AFM nanolithography technique", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.607266

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