Phase-shift mask for EUV lithography

C. Constancias; M. Richard; D. Joyeux; J. Chiaroni; R. Blanc; J. Y. Robic; E. Quesnel; V. Muffato

doi:10.1117/12.655583

23 March 2006 Phase-shift mask for EUV lithography

C. Constancias, M. Richard, D. Joyeux, J. Chiaroni, R. Blanc, J. Y. Robic, E. Quesnel, V. Muffato

Proceedings Volume 6151, Emerging Lithographic Technologies X; 61511W (2006) https://doi.org/10.1117/12.655583
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

EUV lithography is expected to be inserted for the 32 nm node and extended for the 22 nm and below. Phase shift masks (PSM) are evaluated as a possible option to push the resolution limit of the Extreme Ultra violet lithography. This paper will focus on designs and measurements of PSM implemented by etching into the Mo/Si multilayer (ML). The design and the technological developments to elaborate PSM by etching is described. Phase shift Sample (PSS) have been carried out to calibrate in "true operating conditions", i.e. through the measurement of the phase shift they produce on a reflected wavefront, at the wavelength (λ=13.5nm). The method of calibration have been investigated with a Fresnel bimirror interferometer installed on the PSI Swiss Light Source Synchrotron to measure directly the value of interest, i.e the optical phase.

Citation Download Citation

C. Constancias, M. Richard, D. Joyeux, J. Chiaroni, R. Blanc, J. Y. Robic, E. Quesnel, and V. Muffato "Phase-shift mask for EUV lithography", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61511W (23 March 2006); https://doi.org/10.1117/12.655583

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