Self-interferometric electrical image monitors

Juliet Holwill; Andrew R. Neureuther

doi:10.1117/12.656745

24 March 2006 Self-interferometric electrical image monitors

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 615215 (2006) https://doi.org/10.1117/12.656745
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Self-interferometric based electrical test patterns are proposed for highly-sensitive systematic projection printing field mapping and production wafer monitoring. The strategy is to adapt the high sensitivity of Pattern-And-Interferometric-Probe monitors for aberrations to electrical testing by means of short loop and within process flow process step sequences. For this application the measurement of the presence or absence of contact sized hole in the resist in a focus-exposure matrix would be replaced by the creation of an electrical open or short in a nominally conducting minimum sized feature. Both double exposure and single exposure test patterns are presented. Detailed image simulations have been used to demonstrate the principles, create layout designs, characterize performance and compare the enhanced sensitivity relative to typical circuit layout features. Sensitivities of 8% of the clear field per 0.01λ RMS have been verified through simulation of the electrical test pattern. Layouts of these patterns have been placed on multiple-student PSM test reticles for future experimental validation.

Citation Download Citation

Juliet Holwill and Andrew R. Neureuther "Self-interferometric electrical image monitors", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 615215 (24 March 2006); https://doi.org/10.1117/12.656745

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