Paper
8 February 2007 Lanthanide impurity level location in GaN, AlN, and ZnO
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Abstract
A method that has proven succesful in locating the energy levels of divalent and trivalent lanthanide ions (Ce, Pr,..., Eu,...Yb, Lu) in wide band gap inorganic compounds like YPO4 and CaF2 is applied to locate lanthanide levels in the wideband semiconductors GaN, AlN, their solid solutions AlxGa1-xN, and ZnO. The proposed schemes provide a description of relevant optical and luminescence properties of these lanthanide doped semiconductors. Especially, the relation between thermal quenching of Tb3+ emission and the location of the energy levels is explained.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Dorenbos and E. van der Kolk "Lanthanide impurity level location in GaN, AlN, and ZnO", Proc. SPIE 6473, Gallium Nitride Materials and Devices II, 647313 (8 February 2007); https://doi.org/10.1117/12.698977
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Cited by 22 scholarly publications.
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KEYWORDS
Lanthanides

Ions

Europium

Gallium nitride

Terbium

Aluminum nitride

Zinc oxide

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