A study of voltage contrast image using Monte Carlo simulation

T. Ota; T. Koshiba; T. Nakasugi

doi:10.1117/12.711405

15 March 2007 A study of voltage contrast image using Monte Carlo simulation

T. Ota, T. Koshiba, T. Nakasugi

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 651712 (2007) https://doi.org/10.1117/12.711405
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Using Monte Carlo simulation, we studied voltage contrast (VC) image caused by negative charging. In order to simulate the VC image, we have developed an electron scattering program based on a consideration of the spatial charge conduction model. Also we have established a cluster computing system of 60 CPUs to shorten the processing time. Using a Monte Carlo simulator, we succeeded in obtaining the simulated VC image. Comparison between simulated images and experimental images reveals that the simulated images are in good agreement with some experimental images.

Citation Download Citation

T. Ota, T. Koshiba, and T. Nakasugi "A study of voltage contrast image using Monte Carlo simulation", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651712 (15 March 2007); https://doi.org/10.1117/12.711405

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