Discharge produced plasma source for EUV lithography

V. Borisov; A. Eltzov; A. Ivanov; O. Khristoforov; Yu. Kirykhin; A. Vinokhodov; V. Vodchits; V. Mishhenko; A. Prokofiev

doi:10.1117/12.740590

12 April 2007 Discharge produced plasma source for EUV lithography

V. Borisov, A. Eltzov, A. Ivanov, O. Khristoforov, Yu. Kirykhin, A. Vinokhodov, V. Vodchits, V. Mishhenko, A. Prokofiev

Proceedings Volume 6611, Laser Optics 2006: High-Power Gas Lasers; 66110B (2007) https://doi.org/10.1117/12.740590
Event: Laser Optics 2006, 2006, St. Petersburg, Russian Federation

Abstract

Extreme ultraviolet (EUV) radiation is seen as the most promising candidate for the next generation of lithography and semiconductor chip manufacturing for the 32 nm node and below. The paper describes experimental results obtained with discharge produced plasma (DPP) sources based on pinch effect in a Xe and Sn vapour as potential tool for the EUV lithography. Problems of DPP source development are discussed.

Citation Download Citation

V. Borisov, A. Eltzov, A. Ivanov, O. Khristoforov, Yu. Kirykhin, A. Vinokhodov, V. Vodchits, V. Mishhenko, and A. Prokofiev "Discharge produced plasma source for EUV lithography", Proc. SPIE 6611, Laser Optics 2006: High-Power Gas Lasers, 66110B (12 April 2007); https://doi.org/10.1117/12.740590

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