Fabrication and Evaluation of Mo-Si Multilayer Mirrors for Soft X-Rays

Masaki Yamamoto; Akira Arai; Masayuki Watanabe; Takeshi Namioka

doi:10.1117/12.964828

9 April 1987 Fabrication and Evaluation of Mo-Si Multilayer Mirrors for Soft X-Rays

Masaki Yamamoto, Akira Arai, Masayuki Watanabe, Takeshi Namioka

Proceedings Volume 0688, Multilayer Structures & Laboratory X-Ray Laser Research; (1987) https://doi.org/10.1117/12.964828
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

Mo-Si multilayers were fabricated by means of ion-beam sputtering. The reflectances of Mo-Si multilayers, single layers of Mo and Si, and a glass substrate were measured for s-polarization with synchrotron radiation. The peak reflectance of the best Mo-Si multilayer was 17.5% at 13.7 nm. The optical constants of Mo, Si and BK7 glass obtained from the reflectance data are given at a wavelength region of 12nm (104eV) to 20nm (62.3eV).

Citation Download Citation

Masaki Yamamoto, Akira Arai, Masayuki Watanabe, and Takeshi Namioka "Fabrication and Evaluation of Mo-Si Multilayer Mirrors for Soft X-Rays", Proc. SPIE 0688, Multilayer Structures & Laboratory X-Ray Laser Research, (9 April 1987); https://doi.org/10.1117/12.964828

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