Anti-reflective coating for multipatterning lithography

Douglas J. Guerrero; Steve Gibbons; Joyce Lowes; Ramil Mercado

doi:10.1117/12.772827

26 March 2008 Anti-reflective coating for multipatterning lithography

Douglas J. Guerrero, Steve Gibbons, Joyce Lowes, Ramil Mercado

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69230X (2008) https://doi.org/10.1117/12.772827
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

New bottom anti-reflective coatings (BARCs) have been developed that can be incorporated into multiple patterning schemes utilizing scanner-track-only processes. The BARCs have modifiable optical properties and can be removed during the resist development step. Several dual patterning schemes were investigated for trench printing. The most promising process produced 110 nm trenches with approximately 1:1 space ratios. The etch characteristics of these BARCs under fluorinated and oxygenated gases were determined.

Citation Download Citation

Douglas J. Guerrero, Steve Gibbons, Joyce Lowes, and Ramil Mercado "Anti-reflective coating for multipatterning lithography", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69230X (26 March 2008); https://doi.org/10.1117/12.772827

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