Paper
18 November 2008 Plasmon-enhanced luminescence from nanocrystalline SiC films through adjusting spacer layer thickness
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Proceedings Volume 7135, Optoelectronic Materials and Devices III; 71354E (2008) https://doi.org/10.1117/12.804354
Event: Asia-Pacific Optical Communications, 2008, Hangzhou, China
Abstract
We report the photoluminescence enhancement of nc-SiC films by coating nanostructure Ag films and study the influences of surface plasmon on photoluminescence properties by varying spacer thickness. PL curves of the samples deposited with different thickness of α-SiNx present two PL peaks which are contributed to the interference in the films and surface plasmon resonance, respectively. The PL intensity of the sample coated with Ag film is quenched due to combination of Forster nonradiative process and coherent photonic mode reduction in nc-SiC films, while the PL intensity of the samples with inserted spacer α-SiNx is enhanced because of the surface plasmon resonance.
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Wei Yu, Jing Yu, Wanbing Lu, Yalan Bian, Chunsheng Wang, and Guangsheng Fu "Plasmon-enhanced luminescence from nanocrystalline SiC films through adjusting spacer layer thickness", Proc. SPIE 7135, Optoelectronic Materials and Devices III, 71354E (18 November 2008); https://doi.org/10.1117/12.804354
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KEYWORDS
Surface plasmons

Silver

Luminescence

Silicon carbide

Absorption

Reflectivity

Resonance enhancement

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