Laser-produced plasma source development for EUV lithography

Akira Endo; Hiroshi Komori; Yoshifumi Ueno; Krzysztof M. Nowak; Yabu Takayuki; Yanagida Tatsuya; Takashi Suganuma; Takeshi Asayama; Hiroshi Someya; Hideo Hoshino; Masaki Nakano; Masato Moriya; Toshihiro Nishisaka; Tamotsu Abe; Akira Sumitani; Hitoshi Nagano; Youichi Sasaki; Shinji Nagai; Yukio Watanabe; Georg Soumagne; Takanobu Ishihara; Osamu Wakabayashi; Kouji Kakizaki; Hakaru Mizoguchi

doi:10.1117/12.813639

17 March 2009 Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, Krzysztof M. Nowak, Yabu Takayuki, Yanagida Tatsuya, Takashi Suganuma, Takeshi Asayama, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Masato Moriya, Toshihiro Nishisaka, Tamotsu Abe, Akira Sumitani, Hitoshi Nagano, Youichi Sasaki, Shinji Nagai, Yukio Watanabe, Georg Soumagne, Takanobu Ishihara, Osamu Wakabayashi, Kouji Kakizaki, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 7271, Alternative Lithographic Technologies; 727108 (2009) https://doi.org/10.1117/12.813639
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

We are developing a CO₂ laser driven Tin plasma EUV source for HVM EUVL. This approach enables cost-effective EUV power scaling by high-conversion efficiency and full recovery of Tin fuel. The RF-excited, multi 10 kW average power pulsed CO₂ laser system is a MOPA (master oscillator power amplifier) configuration and operates at 100 kHz with 20 ns pulse width. The EUV light source is scalable to in-band 200 W IF power with a single 20-kW CO₂ laser beam. EUV chamber is kept uncontaminated by using a small size droplet target and effective Tin exhaust by magnetic plasma guiding. Characterization of the plasma flow in uniform magnetic field was studied by monitoring the motion of Tin plasma stream in a large vacuum chamber, depending on the magnetic flux up to 2 T. Topics relevant for HVM source is reported on continuous operation and Tin vapor evacuation.

Citation Download Citation

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, Krzysztof M. Nowak, Yabu Takayuki, Yanagida Tatsuya, Takashi Suganuma, Takeshi Asayama, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Masato Moriya, Toshihiro Nishisaka, Tamotsu Abe, Akira Sumitani, Hitoshi Nagano, Youichi Sasaki, Shinji Nagai, Yukio Watanabe, Georg Soumagne, Takanobu Ishihara, Osamu Wakabayashi, Kouji Kakizaki, and Hakaru Mizoguchi "Laser-produced plasma source development for EUV lithography", Proc. SPIE 7271, Alternative Lithographic Technologies, 727108 (17 March 2009); https://doi.org/10.1117/12.813639

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