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18 March 2009 Improving optical measurement accuracy using multi-technique nested uncertainties
R. M. Silver, N. F. Zhang, B. M. Barnes, H. Zhou, A. Heckert, R. Dixson, T. A. Germer, B. Bunday
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Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 727202 (2009) https://doi.org/10.1117/12.816569
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States
Abstract
This paper compares and contrasts different combinations of scatterfield and scatterometry optical configurations as well as introduces a new approach to embedding atomic force microscopy (AFM) or other reference metrology results directly in the uncertainty analysis and library-fitting process to reduce parametric uncertainties. We present both simulation results and experimental data demonstrating this new method, which is based on the application of a Bayesian analysis to library-based regression fitting of optical critical dimension (OCD) data. We develop the statistical methods to implement this approach of nested uncertainty analysis and give several examples, which demonstrate reduced uncertainties in the final combined measurements. The approach is also demonstrated through a combined reference metrology application using several independent measurement methods.
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R. M. Silver, N. F. Zhang, B. M. Barnes, H. Zhou, A. Heckert, R. Dixson, T. A. Germer, and B. Bunday "Improving optical measurement accuracy using multi-technique nested uncertainties", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 727202 (18 March 2009); https://doi.org/10.1117/12.816569
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Cited by 22 scholarly publications and 3 patents.
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KEYWORDS
Metrology
Critical dimension metrology
Atomic force microscopy
Scatterometry
Optical testing
Scanning electron microscopy
Reflectivity
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