C-quad polarized illumination for back end thin wire: moving beyond annular illumination regime

Sohan Singh Mehta; Hyung-Rae Lee; Bassem Hamieh; Chidam Kallingal; Itty Matthew; Ramya Viswanathan; Derren N. Dunn

doi:10.1117/12.814296

16 March 2009 C-quad polarized illumination for back end thin wire: moving beyond annular illumination regime

Sohan Singh Mehta, Hyung-Rae Lee, Bassem Hamieh, Chidam Kallingal, Itty Matthew, Ramya Viswanathan, Derren N. Dunn

Proceedings Volume 7274, Optical Microlithography XXII; 72742Y (2009) https://doi.org/10.1117/12.814296
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

The objective of this work is to describe the advances in the use of C-Quad polarized illumination for densest pitches in back end of line thin wire in 32m technology and outlook for 28 nm technology with NA of 1.35 on a 193nm wavelength scanner. Through simulation and experiments, we found that moving from Annular to C-Quad illumination provides improvement in intensity and contrast. We studied the patterning performance of C-Quad illumination for 1D dense, semi dense, isolated features with and without polarization. Polarization shows great improvement in contrast and line edge roughness for dense pattern. Patterning performance of isolated and semi-isolated features was the same with and without polarization.

Citation Download Citation

Sohan Singh Mehta, Hyung-Rae Lee, Bassem Hamieh, Chidam Kallingal, Itty Matthew, Ramya Viswanathan, and Derren N. Dunn "C-quad polarized illumination for back end thin wire: moving beyond annular illumination regime", Proc. SPIE 7274, Optical Microlithography XXII, 72742Y (16 March 2009); https://doi.org/10.1117/12.814296

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