Paper
19 May 2009 Holographic fabrication of periodic structures on silicon as antireflective layers for high efficiency solar cells
Xiaoyun Chen, Xiangsu Zhang, Shou Liu, Xuechang Ren, Canhui Wang
Author Affiliations +
Abstract
The paper presents the investigation on the anti-reflection property of 2-dimensional periodic structures on silicon surface for high efficiency solar cells. The characteristics of micron-to-submicron periodic surface-relief structures for broadband anti-reflection silicon layers are studied theoretically and experimentally. Theoretical analysis is carried out to determine the appropriate sturcture period. Hexagonal and cross grating structures were fabricated on the surfaces of silicon wafers using hologrpahic and wet etching techniques. Measurement on the silicon wafers with fabricated structures shows significant reduction of surface reflection for the wavelength from 300 nm to 1100 nm.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaoyun Chen, Xiangsu Zhang, Shou Liu, Xuechang Ren, and Canhui Wang "Holographic fabrication of periodic structures on silicon as antireflective layers for high efficiency solar cells", Proc. SPIE 7358, Holography: Advances and Modern Trends, 735819 (19 May 2009); https://doi.org/10.1117/12.820530
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KEYWORDS
Silicon

Diffraction

Semiconducting wafers

Reflectivity

Diffraction gratings

Holography

Solar cells

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